Expertise of members of our staff in various areas of
optical metrologies
Selected papers in Interferometry:
Walecki et al, "Characterization of the polarization state of weak ultrashort
coherent signals by dual-channel spectral interferometry" Optics Letters,
Vol. 22, Issue 2, pp. 81-83 (1997)
Walecki et al, "Measurement of the ultrafast polarization dynamics of weak
four-wave mixing signals by dual-channel femtosecond spectral
interferometry" JOSA B, Vol. 15, Issue 3, pp. 1218-1223 (1997)
Walecki et al "Non-contact fast wafer metrology for ultra-thin patterned
wafers mounted on grinding and dicing tapes" Electronics Manufacturing
Technology Symposium, 2004. IEEE/CPMT/SEMI 29th International
Volume , Issue , July 14-16, 2004 Page(s): 323 - 325
Walecki et al "Temporally and spectrally resolved amplitude and phase of
coherent four-wave-mixing emission from GaAs quantum wells" Phys. Rev.
B 56, 9738 - 9743 (1997)
Walecki, et al, "Interferometric Metrology for Thin and Ultra-Thin
Compound Semiconductor Structures Mounted on …" GaAs Mantech 2004
Walecki et al "Low-coherence interferometric absolute distance gauge for
study of MEMS structures" Proc. SPIE, Vol. 5716, 182 (2005); DOI:
10.1117/12.590013
Walecki et al "Novel noncontact thickness metrology for backend
manufacturing of wide bandgap light emitting devices " physica status solidi
(c), Volume 2 Issue 3, Pages 984 - 989 Published Online: 16 Feb 2005
Walecki et al, " Advanced Fringe Analysis Techniques in Circuit Edit",
ISTFA 2006
Walecki et al, High-speed high-accuracy fiber optic low-coherence
interferometry for in situ grinding and etching process monitoring [6293-13]
PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR
OPTICAL ENGINEERING Bibliographic details 2006, VOL 6293, pages
62930D
Walecki et al , "Synchronized low coherence interferometry for in-situ and
ex-situ metrology for semiconductor manufacturing" Proc. SPIE, Vol. 5880,
58800H (2005); DOI:10.1117/12.615254
optical engineering
spectroscopy
software development
spectral metrology
dimensional metrology
optical metrologies
Selected papers in Interferometry:
Walecki et al, "Characterization of the polarization state of weak ultrashort
coherent signals by dual-channel spectral interferometry" Optics Letters,
Vol. 22, Issue 2, pp. 81-83 (1997)
Walecki et al, "Measurement of the ultrafast polarization dynamics of weak
four-wave mixing signals by dual-channel femtosecond spectral
interferometry" JOSA B, Vol. 15, Issue 3, pp. 1218-1223 (1997)
Walecki et al "Non-contact fast wafer metrology for ultra-thin patterned
wafers mounted on grinding and dicing tapes" Electronics Manufacturing
Technology Symposium, 2004. IEEE/CPMT/SEMI 29th International
Volume , Issue , July 14-16, 2004 Page(s): 323 - 325
Walecki et al "Temporally and spectrally resolved amplitude and phase of
coherent four-wave-mixing emission from GaAs quantum wells" Phys. Rev.
B 56, 9738 - 9743 (1997)
Walecki, et al, "Interferometric Metrology for Thin and Ultra-Thin
Compound Semiconductor Structures Mounted on …" GaAs Mantech 2004
Walecki et al "Low-coherence interferometric absolute distance gauge for
study of MEMS structures" Proc. SPIE, Vol. 5716, 182 (2005); DOI:
10.1117/12.590013
Walecki et al "Novel noncontact thickness metrology for backend
manufacturing of wide bandgap light emitting devices " physica status solidi
(c), Volume 2 Issue 3, Pages 984 - 989 Published Online: 16 Feb 2005
Walecki et al, " Advanced Fringe Analysis Techniques in Circuit Edit",
ISTFA 2006
Walecki et al, High-speed high-accuracy fiber optic low-coherence
interferometry for in situ grinding and etching process monitoring [6293-13]
PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR
OPTICAL ENGINEERING Bibliographic details 2006, VOL 6293, pages
62930D
Walecki et al , "Synchronized low coherence interferometry for in-situ and
ex-situ metrology for semiconductor manufacturing" Proc. SPIE, Vol. 5880,
58800H (2005); DOI:10.1117/12.615254
optical engineering
spectroscopy
software development
spectral metrology
dimensional metrology
Sample Measurement and Analysis Services
We provide sample stress measurement and analysis services. As a result of
measurement you will receive sample measurement report, supported by full
information on traceability of our laboratory instrumentation.
In addition to standard report our engineering staff will be happy to discuss
any additional measurements such as QE mapping, roughness, diffuse
reflection whichever you may have.
Please do not hesitate to contact us and discuss more details.
We provide sample stress measurement and analysis services. As a result of
measurement you will receive sample measurement report, supported by full
information on traceability of our laboratory instrumentation.
In addition to standard report our engineering staff will be happy to discuss
any additional measurements such as QE mapping, roughness, diffuse
reflection whichever you may have.
Please do not hesitate to contact us and discuss more details.
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sales@zebraoptical.com
Tel: 1 215 740 4831
Fax: 1 954 654 1734
Tel: 1 215 740 4831
Fax: 1 954 654 1734
ZebraOptical Optoprofiler: Services