Sample Measurement and Analysis Services
We provide sample stress measurement and analysis services. As a result of
measurement you will receive sample measurement report, supported by full
information on the traceability of our laboratory instrumentation.

In addition to standard report our engineering staff will be happy to discuss any
additional measurements such as QE mapping, roughness, diffuse reflection
whichever you may have.

Please do not hesitate to
contact us and discuss more details.   


Expertise of members of our staff in various areas

Selected papers in Intereferometry:

Walecki et al, "Characterization of the polarization state of weak ultrashort coherent
signals by dual-channel spectral interferometry" Optics Letters, Vol. 22, Issue 2, pp.
81-83

Walecki et al, "Measurement of the ultrafast polarization dynamics of weak four-wave
mixing signals by dual-channel femtosecond spectral interferometry" JOSA B, Vol.
15, Issue 3, pp. 1218-1223

Walecki et al "Non-contact fast wafer metrology for ultra-thin patterned wafers
mounted on grinding and dicing tapes" Electronics Manufacturing Technology
Symposium, 2004. IEEE/CPMT/SEMI 29th International Volume, Issue, July 14-16,
2004 Page(s): 323 - 325

Walecki et al "Temporally and spectrally resolved amplitude and phase of coherent
four-wave-mixing emission from GaAs quantum wells" Phys. Rev. B 56, 9738 - 9743
(1997)

Walecki, et al, "Interferometric Metrology for Thin and Ultra-Thin Compound
Semiconductor Structures Mounted on …" GaAs Mantech 2004

Walecki et al "Low-coherence interferometric absolute distance gauge for study of
MEMS structures" Proc. SPIE, Vol. 5716, 182 (2005); DOI:10.1117/12.590013  

Walecki et al "Novel noncontact thickness metrology for backend manufacturing of
wide bandgap light emitting devices " physica status solidi (c), Volume 2 Issue 3,
Pages 984 - 989 Published Online: 16 Feb 2005

Walecki et al, " Advanced Fringe Analysis Techniques in Circuit Edit", ISTFA 2006

Walecki et al, High-speed high-accuracy fiber optic low-coherence interferometry for
in situ grinding and etching process monitoring [6293-13] PROCEEDINGS- SPIE
THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING Bibliographic details
2006, VOL 6293, pages 62930D  

Walecki et al , "Synchronized low coherence interferometry for in- situ and ex-situ
metrology for semiconductor manufacturing" Proc. SPIE, Vol. 5880, 58800H (2005);
DOI:10.1117/12.615254
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