Sample Measurement and Analysis Services
We provide sample stress measurement and analysis services. As a result of measurement you will
receive sample measurement report, supported by full information on the traceability of our laboratory
instrumentation.

In addition to standard report our engineering staff will be happy to
discuss any additional measurements such as QE mapping,
roughness, diffuse reflection whichever you may have.

Please do not hesitate to
contact us and discuss more details.   
Expertise of members of our staff in various areas
Selected papers in Interferometry:
Walecki et al, "Characterization of the polarization state of weak ultrashort coherent signals by dual-
channel spectral interferometry" Optics Letters, Vol. 22, Issue 2, pp. 81-83

Walecki et al, "Measurement of the ultrafast polarization dynamics of weak four-wave mixing signals by
dual-channel femtosecond spectral interferometry" JOSA B, Vol. 15, Issue 3, pp. 1218-1223

Walecki et al "Non-contact fast wafer metrology for ultra-thin patterned wafers mounted on grinding and
dicing tapes" Electronics Manufacturing Technology Symposium, 2004. IEEE/CPMT/SEMI 29th
International Volume , Issue , July 14-16, 2004 Page(s): 323 - 325

Walecki et al "Temporally and spectrally resolved amplitude and phase of coherent four-wave-mixing
emission from GaAs quantum wells" Phys. Rev. B 56, 9738 - 9743 (1997)

Walecki, et al, "Interferometric Metrology for Thin and Ultra-Thin Compound Semiconductor Structures
Mounted on …" GaAs Mantech 2004

Walecki et al "Low-coherence interferometric absolute distance gauge for study of MEMS structures"
Proc. SPIE, Vol. 5716, 182 (2005); DOI:10.1117/12.590013  

Walecki et al "Novel noncontact thickness metrology for backend manufacturing of wide bandgap light
emitting devices " physica status solidi (c), Volume 2 Issue 3, Pages 984 - 989 Published Online: 16
Feb 2005

Walecki et al, " Advanced Fringe Analysis Techniques in Circuit Edit", ISTFA 2006

Walecki et al, High-speed high-accuracy fiber optic low-coherence interferometry for in situ grinding and
etching process monitoring [6293-13] PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR
OPTICAL ENGINEERING  Bibliographic details 2006, VOL 6293, pages 62930D  

Walecki et al , "Synchronized low coherence interferometry for in- situ and ex-situ metrology for
semiconductor manufacturing" Proc. SPIE, Vol. 5880, 58800H (2005); DOI:10.1117/12.615254
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