Sample Measurement and Analysis Services
We provide sample stress measurement and analysis services. As a result of
measurement you will receive sample measurement report, supported by full
information on the traceability of our laboratory instrumentation.

In addition to standard report our engineering staff will be happy to
discuss any additional measurements such as QE mapping,
roughness, diffuse reflection whichever you may have.

Please do not hesitate to
contact us and discuss more details.   
Expertise of members of our staff in various areas
Selected papers in Interferometry:
Walecki et al, "Characterization of the polarization state of weak ultrashort
coherent signals by dual-channel spectral interferometry" Optics Letters, Vol.
22, Issue 2, pp. 81-83

Walecki et al, "Measurement of the ultrafast polarization dynamics of weak
four-wave mixing signals by dual-channel femtosecond spectral
interferometry" JOSA B, Vol. 15, Issue 3, pp. 1218-1223

Walecki et al "Non-contact fast wafer metrology for ultra-thin patterned wafers
mounted on grinding and dicing tapes" Electronics Manufacturing Technology
Symposium, 2004. IEEE/CPMT/SEMI 29th International Volume , Issue , July 14-
16, 2004 Page(s): 323 - 325

Walecki et al "Temporally and spectrally resolved amplitude and phase of
coherent four-wave-mixing emission from GaAs quantum wells" Phys. Rev. B
56, 9738 - 9743 (1997)

Walecki, et al, "Interferometric Metrology for Thin and Ultra-Thin Compound
Semiconductor Structures Mounted on …" GaAs Mantech 2004

Walecki et al "Low-coherence interferometric absolute distance gauge for
study of MEMS structures" Proc. SPIE, Vol. 5716, 182 (2005); DOI:10.1117/12.
590013  

Walecki et al "Novel noncontact thickness metrology for backend
manufacturing of wide bandgap light emitting devices " physica status solidi
(c), Volume 2 Issue 3, Pages 984 - 989 Published Online: 16 Feb 2005

Walecki et al, " Advanced Fringe Analysis Techniques in Circuit Edit", ISTFA
2006

Walecki et al, High-speed high-accuracy fiber optic low-coherence
interferometry for in situ grinding and etching process monitoring [6293-13]
PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING  
Bibliographic details 2006, VOL 6293, pages 62930D  

Walecki et al , "Synchronized low coherence interferometry for in- situ and ex-
situ metrology for semiconductor manufacturing" Proc. SPIE, Vol. 5880,
58800H (2005); DOI:10.1117/12.615254
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